Chemically Amplified Bilevel Resist Based on Condensation of Siloxanes
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概要
- 論文の詳細を見る
This paper deals with a negative bilevel resist which is based on the acid-catalyzed condensation reaction of poly(siloxane)s. The resist systems consist of photoacid generators and poly(siloxane). Ph_3S^+OTf^- reveals an efficient activity for silanol condensation and the system has a high sensitivity of 0.31 mJ/cm^2. Tetrafunctional silane plays the role of crosslinker in this system. Sensitivity improvement of low-sensitivity systems such as benzoin p-toluenesulfonate/ poly(siloxane) can be achieved by this method.
- 社団法人応用物理学会の論文
- 1991-11-30
著者
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamashita Yoshio
Semiconductor Technology Lab. Oki Electric Industry Co. Ltd
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Sakata M
Omron Corp. Ibaraki Jpn
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Ito T
Osaka Univ. Osaka Jpn
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ITO Toshio
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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Sakata Miwa
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Yamashita Yoshio
Semiconductor Technology Lab. Oki Electric Industry Co. Lid.
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