Effects of Vacuum-Ultraviolet-Light-Induced Surface Reaction on Selective and Anisotropic Etching of Silicon Dioxide Using Anhydrous Hydrogen Fluoride Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-12-30
著者
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Imai Hideo
Department Of Agronomy Faculty Of Agriculture University Of Kyushu
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Imai Hideo
Department Of Electrical Engineering And Electronics Faculty Of Engineering Seikei University
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SAITO Yoji
Department of Electrical Engineering and Electronics, Faculty of Engineering, Seikei University
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SUGITA Yoshihiro
ULSI Research Division, Fujitsu Laboratories Ltd.
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ITO Takashi
ULSI Research Division, Fujitsu Laboratories Ltd.
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Sugita Y
Department Of Physics Toyama University
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Imai H
Keio Univ. Yokohama Jpn
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Ito T
Osaka Univ. Osaka Jpn
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Saito Yoji
Department Of Anesthesiology School Of Medicine Shimane University
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