X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si (100) Formed by Chemical Treatment
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-10-15
著者
-
Watanabe S
Univ. Tokyo Tokyo Jpn
-
SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
-
WATANABE Satoru
Fujitsu Laboratories Ltd.
-
AWAJI Naoki
Fujitsu Laboratories Ltd.
-
Watanabe S
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
-
Watanabe S
Division Of Materials Science Graduate School Of Engineering Hokkaido University
-
Sugita Yutaka
Research Institute Of Electrical Communication Tohoku University
-
Sugita Yutaka
Hitachi Research Laboratory Hitachi Lid.
-
Watanabe Seiichi
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
-
Sugita Y
Department Of Physics Toyama University
-
Awaji Naoki
Sortec Corporation:(present Address)fujitsu Laboratories Ltd.
-
WATANABE Shigeya
Department of Engineering Physics, Faculty of Engineering, Kyoto University
-
Watanabe Satoru
Fujita Health University
関連論文
- X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si (100) Formed by Chemical Treatment
- Transient Oxide Layer at a Thermally Grown SiO_2/Si Interface, Interpreted Based on Local Vibration and X-Ray Reflectivity
- X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment
- Boundary Structure of Mo/Si Multilayers for Soft X-Ray Mirrors
- Electron-Irradiation-Induced Amorphization in Mo/Si Nano-Multilayer Material
- Monojets and Production of a New Heavy Particle : Particles and Fields
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics(High-κ Gate Dielectrics)
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics
- Proposal of Cryogenic Plasmas in Liquid Helium II
- Possible Existence of a Transient Superfluid Plasma in Liquid Helium II
- Exchange Couplings in Ni-Fe/Mn-Ir/Fe-Mn Multilayers
- Exchange Coupling in (Mn-Ir, Fe-Mn)/Co/Ni-Fe Multilayers
- Giant Magnetoresistance and Low Saturation Fields in Ni-Fe-Co/Cu Multilayers with NiO Buffer Layers
- Magnetoresistance in Fe-Mn/Ni-Fe-Co/Co/Cu/Co/Ni-Fe-Co Sandwiches with NiO or NiO/Hf Buffer Layer
- Exchange Coupling between Antiferromagnetic Mn-Ir and Ferromagnetic Ni-Fe Layers
- Magnetoresistance Effects of Fe-Mn/Ni-Fe-Co/(Au, Ag, Al)/Ni-Fe-Co Sandwiches
- Magnetoresistance Effects in Ni-Fe-Co/Cu/Co-Pt Trilayers
- Magnetoresistance Effects in Spin-Valve Multilayers Including Three Ni-Fe-Co Layers
- Magnetoresistance and Interlayer Exchange Coupling between Magnetic Layers in Fe-Mn/Ni-Fe-Co/Cu/Ni-Fe-Co Multilayers
- Magnetoresistance and Preferred Orientation in Fe-Mn/Ni-Fe/Cu/Ni-Fe Sandwiches with Various Buffer Layer Materials
- Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality silicon Epitaxy : Beam Induced Physics and Chemistry
- Effects of Fe Buffer Layer Thickness on Magnetoresistance in Ni-Fe/Cu Multilayers
- Oscillation of Preferred Orientation with Thickness of Cu Layer in Ni-Fe/Cu Multilayers
- Mechanism of the Reduction of Electron Shading Charge Build-up Using Pulsed Plasma
- High-Frequency Measurements of Plasma Parameters in Electron Cyclotron Resonance Plasma Etchers(Nuclear Science, Plasmas, and Electric Discharges)
- Evaluation of Charge Passed through Gate-Oxide Films Using a Charging Damage Measurement Electrode
- Production of highly uniform electron cyclotron resonance plasmas by distribution control of the microwave electric field
- Slant Slot Antenna-Type Electron Cyclotron Resonance Plasma Source
- Grown-in Microdefects in a Slowly Grown Czochralski Silicon Crystal Observed by Synchrotron Radiation Topography
- Mierodefects in an As-Grown Czoehralski Silicon Crystal Studied by Synchrotron Radiation Section Topography with Aid of Computer Simulation
- Observation of Microdefects in As-Grown Czochralski Silicon Crystals by Synchrotron Radiation Topography
- Synchrotron Radiation Section Topography with Extremely High-Order Reflection and Its Application to the Characterization of MCZ-Silicon Crystals
- Measurement and Analysis of the Static Debye-Waller Factor of Cz-Silicon with Small Oxygen Precipitates : Techniques, Instrumentations and Measurement
- Measurement of the Static Debye-Waller Factor of Silicon Crystals by the Pendellosung Fringe Method
- Dependence of Electric Properties of Al Atomic Chains on Structure of Chain-Electrode Junction
- Theoretical Analysis of Apparent Barrier Height on an Al Surface : Difference by Measurement Methods
- First-Principles Calculation of Vibrational Properties of a Nanostructure in Electric Fields
- Ab Initio Caleulation of Capacitance of Semi-Infinite Jellium Electrodes with a Nanoscale Gap
- First-Principles Study of Apparent Barrier Height : Surfaces, Interfaces, and Films
- Ab Initio Calculation of the Electric Properties of Al Atomic Chains under Finite Bias Voltages : Electronical Properties of Condensed Matter
- Direct Imaging of Thermodynamic Process In Atom Migration by Using Scanning Tunneling Microscopy
- Reduced Density of Missing-Dimer Vacancies on Tungsten-Contaminated Si (100)-(2×n) Surface by Hydrogen Termination
- Control of Surface Current on a Si(111) Surface by Using Nanofabrication
- Concentric Spread Plasma Source
- Theoretical Study of Ga Adsorbates around Dangling-Bond Wires on am H-Terminated Si Surface: Possibility of Atomic-Scale Ferromagnets
- Measurement of a Three-Dimensional Distribution of Microwave Electric Field in Electron Cyclotron Resonance Plasmas
- Initial Stage of Molecular Adsorption on Si(100) and H-terminated Si(100) Investigated by UHV-STM(STM-Si(001))
- Scanning Tunneling Spectroscopy of Dangling-Bond Wires Fabricated on the Si(100) -2 × 1 -H Surface
- Property Change of Si(111) Surface by Scanning Tunneling Microscope Manipulation
- Thermal Stability of the Yttrium Aluminate Film and the Suppression of its structural change and electrical properties degradation
- Wavelength-Dispersive Total Reflection X-Ray Fluorescence with High-Brilliance Undulator Radiation at SPring-8
- Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
- Quantum-Size Effect from Photoluminescence of Low-Temperature-Oxidized Porous Si
- Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
- Densified SiOF Film Formation for Preventing Water Absorption
- High-Density Layer at the SiO_2/Si Interface Observed by Difference X-Ray Reflectivity
- Densified SiOF Film Formation for Preventing Water Absorption
- High-Accuracy X-ray Reflectivity Study of Native Oxide Formed in Chemical Treatment
- Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography
- Development of Highly Stable Synchrotron Radiation Source at SORTEC : X-Ray Lithography
- Development of Highly Stable Synchrotron Radiation Source at SORTEC
- Current-Voltage Characteristics of YBa_2Cu_3O_y/La_Ca_MnO_z/YBa_2Cu_3O_y Trilayered-Type Junctions
- Fabrication of Y-Ba-Cu-O Superconductor/La-Ca-Mn-O Oxide Magnetic Material Layered Films
- Fabrication of CoSi2-Buried-Metal-Layer Si Substrates for Infrared Reflection Absorption Spectroscopy by Wafer-Bonding
- Silicon-Monohydride Termination of Silicon-111 Surface Formed by Boiling Water
- Electrical Properties of SiN/HfO_2/SiON Gate Stacks with High Thermal Stability(High-κ Gate Dielectrics)
- Synchrotron-Radiation-Induced Modification of Silicon Dioxide Film at Room Temperature : Beam Induced Physics and Chemistry
- Synchrotron-Radiation-Induced Modification of Silicon Dioxide Film at Room Temperature
- Synchrotron Radiation-Assisted Removal of Oxygen and Carbon Contaminants from a Silicon Surface
- Metastable Defect Cluster Formation during Radiation-Induced Amorphization in NiTi
- Atomistic observation and simulation analysis of spatiotemporal fluctuations during radiation-induced amorphization
- Effect of Surface Modification by Ion Implantation on Hydrogenation Property of TiFe Alloy
- Dynamical Study of Spatio-Temporal Structural Fluctuations in the Intermetallic Compound Nickel-Titanium during Radiation-Induced Crystalline-to-Amorphous Transformation
- Improvement of Corrosion Resistance and Structural Change in 304 Stainless Steel by means of Ion-Mixing
- IrO_2/Pb(Zr,Ti)O_3/Pt Capacitor Degradation with D_2 Gas at Elevated Temperature
- Formation and Stability of Metallic Silicides during Ion-Beam-Mixing in the Systems of Mo/Si and Ti/Si
- Mechanism of Vestibular Adaptation of Fish under Microgravity
- Mechanism of Vestibular Adaptation of Fish under Microgravity (特集:日本の宇宙生物学実験)
- Spatial Distribution and Transport of an Electron Cyclotron Resonance Plasma Generated Using Dominant-Mode Microwave
- Spatial Distribution Measurement of Microwave Electric Field Using Thermal Sensitive Paper in a Microwave Etching System
- Atomic Step Structure on Vicnal H/Si(111) Surface Formed by Hot Water Immersion
- Large Desorption Yield of Hydrogen Atoms from Silicon Surface in Homogeneous Electron Injection
- Evaluation of Photoemitted Current from SiO_2 Film on Silicon During Synchrotron Radiation Irradiation
- Synchrotron Radiation-Assisted Silicon Film Growth by Irradiation Parallel to the Substrate
- Extra U(1) Phenomenology from the E_8×E_8 Superstring Theory : Particles and Fields
- Effect of Silicon Surface Conditions before Cobalt-Silicidation on Ultra Shallow p^+-n Junction Properties
- Effects of Reaction Product During Hydrogenation of Si Surfaces in HF Solution
- Influence of Microscopic Chemical Reactions on the Preparation of an Oxide-Free Silicon Surface in a Fluorine-Based Solution
- Influence of Microscopic Chemical Reaction on the Preparation of Oxide Free Silicon Surface in Fluorine-Based Solution
- Effects of Reaction Product During Hydrogenation of Si Surfaces in HF Solution
- Fluorine Adsorption and Etching on Si(111):SiH Surface during Immersion in HF Solution
- Observation of Solution/Si Interface Using IR Spectrochemical Cell During Wet Chemical Oxidation
- Structural Changes of Y2O3 and La2O3 Films by Heat Treatment
- Si Quantum Dot Formation with Low-Pressure Chemical Vapor Deposition
- Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
- Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
- In Situ Infrared Spectroscopy on the Wet Chemical Oxidation of Hydrogen-Terminated Si Surfaces
- Diffusion Coefficient of As and P in HfO2
- Nondestructive Measurement of Hexavalent Chromium in Chromate Conversion Coatings Using X-ray Absorption Near Edge Structure
- Diffusion Coefficient of As and P in HfO2