Fabrication of CoSi2-Buried-Metal-Layer Si Substrates for Infrared Reflection Absorption Spectroscopy by Wafer-Bonding
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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TABE Michiharu
Research Institute of Electronics, Shizuoka University
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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URISU Tsuneo
The Graduate University for Advanced Studies, Institute for Molecular Science
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YAMAMURA Shusaku
The Graduate University for Advanced Studies, Institute for Molecular Science
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YAMAUCHI Shouichi
DENSO Research Laboratories
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KASAI Toshio
Graduate School of Science and Engineering, Saitama University
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NONOGAKI Youichi
The Graduate University for Advanced Studies, Institute for Molecular Science
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