Influence of Microscopic Chemical Reactions on the Preparation of an Oxide-Free Silicon Surface in a Fluorine-Based Solution
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概要
- 論文の詳細を見る
It is shown that microscopic chemical reactions influence the hydrogen termination of the Si surface in fluorine-based solution. The hydrogen termination reaction was quite sensitive to the surface structure and the composition of the solution. The remaining hydroxyl group on some specific surface sites was suppressed using a neutral pH solution. It was confirmed that the neutral pH solution was suitable for silicidation on a heavily boron-implanted surface and improved the sheet resistance of titanium silicide on the surface.
- 社団法人応用物理学会の論文
- 1999-04-30
著者
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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Watanabe Satoru
Fujita Health University
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