X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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KOMIYA Satoshi
Fujitsu Laboratories Ltd.
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Komiya Satoshi
Fujitsu Laboratories Lid.
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Watanabe S
Univ. Tokyo Tokyo Jpn
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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AWAJI Naoki
Fujitsu Laboratories Ltd.
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OHKUBO Satoshi
Fujitsu Laboratories Ltd.
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ITO Takashi
Fujitsu Laboratories Ltd.
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Watanabe S
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Watanabe S
Division Of Materials Science Graduate School Of Engineering Hokkaido University
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Sugita Yutaka
Research Institute Of Electrical Communication Tohoku University
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Sugita Yutaka
Hitachi Research Laboratory Hitachi Lid.
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Watanabe Seiichi
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Sugita Y
Department Of Physics Toyama University
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Awaji Naoki
Sortec Corporation:(present Address)fujitsu Laboratories Ltd.
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Ohkubo Shuichi
Ulsi Technology Laboratory Fujitsu Laboratories Ltd.
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WATANABE Shigeya
Department of Engineering Physics, Faculty of Engineering, Kyoto University
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Watanabe Satoru
Fujita Health University
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