Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography

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X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si (100) Formed by Chemical Treatment
Transient Oxide Layer at a Thermally Grown SiO_2/Si Interface, Interpreted Based on Local Vibration and X-Ray Reflectivity
X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment
Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
Wavelength-Dispersive Total Reflection X-Ray Fluorescence with High-Brilliance Undulator Radiation at SPring-8
Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
Characteristics of 0.25 μm Ferroelectric Nonvolatile Memory with a Pb(Zr, Ti)O_3 Capacitor on a Metal/Via-Stacked Plug
0.25μm FeRAM with CMVP (Capacitor-on-Metal/Via-Stacked-Plug) Memory Cell
Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
Densified SiOF Film Formation for Preventing Water Absorption
High-Density Layer at the SiO_2/Si Interface Observed by Difference X-Ray Reflectivity
Densified SiOF Film Formation for Preventing Water Absorption
High-Accuracy X-ray Reflectivity Study of Native Oxide Formed in Chemical Treatment
Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography
Development of Highly Stable Synchrotron Radiation Source at SORTEC : X-Ray Lithography
Development of Highly Stable Synchrotron Radiation Source at SORTEC
Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
Nondestructive Measurement of Hexavalent Chromium in Chromate Conversion Coatings Using X-ray Absorption Near Edge Structure

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