AWAJI Naoki | Fujitsu Laboratories Ltd.
スポンサーリンク
概要
関連著者
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AWAJI Naoki
Fujitsu Laboratories Ltd.
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Awaji Naoki
Sortec Corporation:(present Address)fujitsu Laboratories Ltd.
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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Sugita Yutaka
Research Institute Of Electrical Communication Tohoku University
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Sugita Y
Department Of Physics Toyama University
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Nomura Kenji
Fujitsu Laboratories Ltd.
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KOMIYA Satoshi
Fujitsu Laboratories Ltd.
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Komiya Satoshi
Fujitsu Laboratories Lid.
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Komiya Satoshi
Spring-8/jasri
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Sugita Yutaka
Hitachi Research Laboratory Hitachi Lid.
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Watanabe S
Univ. Tokyo Tokyo Jpn
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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OHKUBO Satoshi
Fujitsu Laboratories Ltd.
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Watanabe S
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Watanabe S
Division Of Materials Science Graduate School Of Engineering Hokkaido University
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Ozaki Shinji
Matsushita Technoresearch Inc.
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Watanabe Seiichi
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Takahashi Mamoru
Corporate Research & Development Center Toshiba Corporation
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WATANABE Shigeya
Department of Engineering Physics, Faculty of Engineering, Kyoto University
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Watanabe Satoru
Fujita Health University
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Yagi Naoto
SPring-8 JASRI
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Inoue Kouji
Advanced Research Center Of Science Faculty Of Science And Technology Kwansei Gakuin University (arc
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Kudo Hiroshi
Department Of Chemistry Graduate School Of Science Tohoku University
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NAKANISHI Toshiro
FUJITSU LABORATOIRES Ltd.
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Doi Syuichi
Fujitsu Laboratories Ltd.
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Ohkubo Shuichi
Ulsi Technology Laboratory Fujitsu Laboratories Ltd.
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DOI Shuichi
Fujitsu Laboratories LTD.
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TAKEMURA Momoko
Corporate Research & Development Center, Toshiba Corporation
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KAMIMUTA Yuichi
Corporate Research & Development Center, Toshiba Corporation
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TAKAHASHI Masao
Osaka University
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TAKAHASHI Isao
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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KADA Tositeru
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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SHIMAZU Hiromitsu
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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TANAKA Norihisa
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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KOMIYA Satoshi
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, Spring-8)
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KUDO Hiroshi
Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.
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SHINOHARA Rika
Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.
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TAKEISHI Shunsaku
Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.
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AWAJI Naoki
Electron Devices and Materials Lab., Fujitsu Lab.Ltd.
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YAMADA Masao
Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.
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TAKASAKI Kanetake
Fujitsu Laboratories Ltd.
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KODAIRA Masanobu
SORTED Corporation
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KISHIMOTO Takeshi
SORTED Corporation
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USAMI Hiroshi
SORTED Corporation
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WATANABE Makio
SORTED Corporation
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Usami H
Yamagata Univ. Yonezawa Jpn
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Usami Hiroshi
Hitachi Ltd.
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Miyatake Kenichiro
Sumitomo Electric Industries Ltd.
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Yamazaki Noboru
Sumitomo Electric Industries Ltd.
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Kishimoto T
Department Of Physics Osaka University
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Kishimoto T
Department Of Electrical Engineering Waseda University
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Takasaki Kanetake
Fujitsu Laboratories Limited
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KONOMI Ichiro
TOYOTA Central Research and Development Laboratories Inc.
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Liu Kuang-yu
Technical Support Center Sony Corporation
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Kawado Seiji
Technical Support Center Sony Corporation:(present Address)rigaku Corporation
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TERAUCHI Hikaru
Advanced Research Center of Science, School of Science and Technology, Kwansei Gakuin University
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ITO Takashi
Fujitsu Laboratories Ltd.
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Konomi Ichiro
Toyota Central R&d Labs. Inc.
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MAEJIMA Yukihiko
SORTEC Corporation
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Terauchi Hikaru
Advanced Research Center Of Science Faculty Of Science And Technology Kwansei Gakuin University (arc
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Yamaguchi Koji
Corporate Research & Development Center Toshiba Corporation
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Inoue Katsuaki
SPring-8 JASRI
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OKAJIMA Toshihiro
Advanced Technology R&D Center, Mitsubishi, Electric Corp.
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Yagi Naoto
Spring-8/jasri
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HIRAI Yasuharu
Advanced Research Laboratory, Hitachi Ltd.
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Hirai Yasuharu
Advanced Research Laboratory Hitachi Ltd.
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Yamamoto Tohru
Central Research Institute Of Electric Power Industry
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Inoue Katsuaki
Spring-8 Japan Synchrotron Radiation Research Institute (jasri)
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IIHARA Junji
Sumitomo Electric Industries, Ltd.
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MIYATAKE Kenichiro
Sumitomo Electric Industries, Ltd.
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YAMAZAKI Noboru
Sumitomo Electric Industries, Ltd.
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Iihara Junji
Sumitomo Electric Industries Ltd.
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KITAHARA Amane
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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NISHINO Junichi
Microelectronics Research Center, SANYO Electric Co., Ltd.
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NOGUCHI Sinichi
Central Research Institute of Electric Power Industry
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SYOJI Takashi
X-ray Laboratories, Rigaku Corporaton
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YAMAGAMI Motoyuki
X-ray Laboratories, Rigaku Corporaton
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KOBAYASHI Akira
Kobe Steel, Ltd.
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HIRAI You
Kobelco Research Institute, Inc.
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SHIBATA Masahiro
Sumitomo Electric Industries, Ltd.
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YAMAGUCHI Koji
Sumitomo Electric Industries, Ltd.
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YASUAMI Shigeru
Toshiba Corporation
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KIMURA Shigeru
System Devices and Fundamental Research, NEC Corporation
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HASEGAWA Masaki
Advanced Research Laboratory, Hitachi Ltd.
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HIROSE Takayuki
Fujielectric Corp. R&D Ltd.
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OHKUBO Satosi
Fujitsu Laboratories Ltd.
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Shinohara Ryoichi
Department Of Electronic Engineering University Of Electro-communications
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Nishino Junichi
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Hirose Takayuki
Fujielectric Corp. R&d Ltd.
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Hirai You
Kobelco Research Institute Inc.
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Syoji Takashi
X-ray Laboratories Rigaku Corporaton
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Maejima Y
Silicon Systems Research Laboratories Nec Corporation
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Okajima Toshihiro
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)jasri
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Shinohara Rika
Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd
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Awaji Naoki
Electron Devices And Materials Lab. Fujitsu Lab. Ltd
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Kitahara Amane
Advanced Research Center Of Science Faculty Of Science And Technology Kwansei Gakuin University (arc
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Yamaguchi Koji
Sumitomo Electric Industries Ltd.
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Yamagami Motoyuki
X-ray Laboratories Rigaku Corporaton
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Takeishi Shunsaku
Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd
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Hasegawa Masaki
Advanced Research Laboratory Hitachi Ltd.
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Shibata Masahiro
Sumitomo Electric Industries Ltd.
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Kimura Shigeru
System Devices And Fundamental Research Nec Corporation
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Terauchi Hikaru
Advanced Research Center Of Science And School Of Science Kwansei-gakuin University
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Kudo Hiroshi
Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd
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Kudo Hiroshi
Thin Film Technology Department Process Development Division Fujitsu Limited
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Takahashi Masao
The Institute Of Scientific And Industrial Research Osaka University
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Kobayashi Akira
Kobe Steel Ltd.
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Yamada Masao
Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd
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Terauchi Hikaru
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Iihara Junji
Sumitomo Electric Industries, Ltd., 1-1-1 Koya-kita, Itami, Hyogo 664-0016, Japan
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Awaji Naoki
Fujitsu Laboratories LTD., 10-1 Morinosato-wakamiya, Atsugi 243-0197, Japan
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Awaji Naoki
Fujitsu Laboratories Ltd., Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Komiya Satoshi
SPring-8/JASRI, Mikazuki, Hyogo 679-5198, Japan
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Komiya Satoshi
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, SPring-8), Mikazuki-cho 679-5198, Japan
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Inoue Kouji
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Doi Syuichi
Fujitsu Laboratories Ltd., Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Takemura Momoko
Corporate Research & Development Center, Toshiba Corporation, 1 Komukaitoshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Tanaka Norihisa
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Doi Shuichi
Fujitsu Laboratories LTD., 10-1 Morinosato-wakamiya, Atsugi 243-0197, Japan
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Kada Tositeru
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Miyatake Kenichiro
Sumitomo Electric Industries, Ltd., 1 Taya-cho, Sakae-ku, Yokohama 244-0844, Japan
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Ozaki Shinji
Matsushita Technoresearch, Inc., 3-1-1 Yakumonakamachi, Moriguchi 570-8501, Japan
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Awaji Naoki
Fujitsu Laboratories, Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Takahashi Isao
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Yagi Naoto
SPring-8/JASRI, Mikazuki, Hyogo 679-5198, Japan
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Inoue Katsuaki
SPring-8/JASRI, Mikazuki, Hyogo 679-5198, Japan
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Shimazu Hiromitsu
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University (ARCS-KGU), Sanda 669-1337, Japan
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Yamazaki Noboru
Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0024, Japan
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Kamimuta Yuichi
Corporate Research & Development Center, Toshiba Corporation, 1 Komukaitoshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Nomura Kenji
Fujitsu Laboratories LTD., 10-1 Morinosato-wakamiya, Atsugi 243-0197, Japan
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Nomura Kenji
Fujitsu Laboratories Ltd., Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Nomura Kenji
Fujitsu Laboratories, Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
著作論文
- X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si (100) Formed by Chemical Treatment
- Transient Oxide Layer at a Thermally Grown SiO_2/Si Interface, Interpreted Based on Local Vibration and X-Ray Reflectivity
- X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment
- Wavelength-Dispersive Total Reflection X-Ray Fluorescence with High-Brilliance Undulator Radiation at SPring-8
- Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
- Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
- Densified SiOF Film Formation for Preventing Water Absorption
- High-Density Layer at the SiO_2/Si Interface Observed by Difference X-Ray Reflectivity
- Densified SiOF Film Formation for Preventing Water Absorption
- High-Accuracy X-ray Reflectivity Study of Native Oxide Formed in Chemical Treatment
- Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography
- Development of Highly Stable Synchrotron Radiation Source at SORTEC : X-Ray Lithography
- Development of Highly Stable Synchrotron Radiation Source at SORTEC
- Detection Limits of Trace Elements for Wavelength Dispersive Total X-Ray Fluorescence under High Flux Synchrotron Radiation
- Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
- Nondestructive Measurement of Hexavalent Chromium in Chromate Conversion Coatings Using X-ray Absorption Near Edge Structure