Awaji Naoki | Electron Devices And Materials Lab. Fujitsu Lab. Ltd

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概要

• AWAJI Naokiの詳細を見る
• 同名の論文著者
• Electron Devices And Materials Lab. Fujitsu Lab. Ltdの論文著者

関連著者

• Shinohara Rika

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Awaji Naoki

  Electron Devices And Materials Lab. Fujitsu Lab. Ltd

• Takeishi Shunsaku

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Kudo Hiroshi

  Thin Film Technology Department Process Development Division Fujitsu Limited

• Yamada Masao

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Kudo Hiroshi

  Department Of Chemistry Graduate School Of Science Tohoku University

• AWAJI Naoki

  Fujitsu Laboratories Ltd.

• KUDO Hiroshi

  Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.

• SHINOHARA Rika

  Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.

• TAKEISHI Shunsaku

  Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.

• AWAJI Naoki

  Electron Devices and Materials Lab., Fujitsu Lab.Ltd.

• YAMADA Masao

  Thin Film Technology Dept., Process Dev.Div., Fujitsu Ltd.

• Shinohara Ryoichi

  Department Of Electronic Engineering University Of Electro-communications

• Kudo Hiroshi

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Takeishi Shunsaku

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

• Awaji Naoki

  Electron Devices and Materials Lab., Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-01, Japan

• Kudo Hiroshi

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

• Shinohara Rika

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

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著作論文

• Densified SiOF Film Formation for Preventing Water Absorption
• Densified SiOF Film Formation for Preventing Water Absorption

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