Densified SiOF Film Formation for Preventing Water Absorption

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概要

• 論文の詳細を見る

• We confirmed that the density of a SiOF film was decreased by the addition of C2F6 as a fluorine source. Such a decrease in the density had the most significant effect on the water absorptivity. Densities of the films were controlled by increasing O2 gas mixture ratios. From the TDS measurements of water desorption and the change in dielectric constants which occurred when the film was exposed to atmosphere, we confirmed that the densified films had lower water absorptivity.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1996-02-28

著者

• Shinohara Rika

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Awaji Naoki

  Electron Devices And Materials Lab. Fujitsu Lab. Ltd

• Takeishi Shunsaku

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Kudo Hiroshi

  Thin Film Technology Department Process Development Division Fujitsu Limited

• Yamada Masao

  Thin Film Technology Dept. Process Dev. Div. Fujitsu Ltd

• Takeishi Shunsaku

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

• Awaji Naoki

  Electron Devices and Materials Lab., Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-01, Japan

• Kudo Hiroshi

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

• Shinohara Rika

  Thin Film Technology Dept., Process Dev. Div., Fujitsu Ltd., 1015 Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan

関連論文

• Densified SiOF Film Formation for Preventing Water Absorption
• Application of SiOF Film Deposited Using TEOS/TEFS/O_2 System to Multi-Level Interconnection Designed with 0.25μm Rule
• Densified SiOF Film Formation for Preventing Water Absorption

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