Watanabe Satoru | Fujita Health University

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概要

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著作論文

X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si (100) Formed by Chemical Treatment
Transient Oxide Layer at a Thermally Grown SiO_2/Si Interface, Interpreted Based on Local Vibration and X-Ray Reflectivity
X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment
Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality silicon Epitaxy : Beam Induced Physics and Chemistry
Silicon-Monohydride Termination of Silicon-111 Surface Formed by Boiling Water
IrO_2/Pb(Zr,Ti)O_3/Pt Capacitor Degradation with D_2 Gas at Elevated Temperature
Mechanism of Vestibular Adaptation of Fish under Microgravity
Mechanism of Vestibular Adaptation of Fish under Microgravity (特集:日本の宇宙生物学実験)
Atomic Step Structure on Vicnal H/Si(111) Surface Formed by Hot Water Immersion
Large Desorption Yield of Hydrogen Atoms from Silicon Surface in Homogeneous Electron Injection
Effects of Reaction Product During Hydrogenation of Si Surfaces in HF Solution
Influence of Microscopic Chemical Reactions on the Preparation of an Oxide-Free Silicon Surface in a Fluorine-Based Solution
Influence of Microscopic Chemical Reaction on the Preparation of Oxide Free Silicon Surface in Fluorine-Based Solution
Effects of Reaction Product During Hydrogenation of Si Surfaces in HF Solution
Fluorine Adsorption and Etching on Si(111):SiH Surface during Immersion in HF Solution
Fabrication of CoSi2-Buried-Metal-Layer Si Substrates for Infrared Reflection Absorption Spectroscopy by Wafer-Bonding
Observation of Solution/Si Interface Using IR Spectrochemical Cell During Wet Chemical Oxidation
Generation of a New Interface State Associated with Ultrathin Gate Dielectrics/Silicon under Electric Stress
Mn2O3 Slurry Reuse by Circulation Achieving High Constant Removal Rate
Mn2O3 Slurry Achieving Reduction of Slurry Waste
Chemical Structure of Nitrogen Atoms in Thin-Film Nitrided Silicon Dioxide Formed on Silicon Substrate after Hydrogenation Reaction in Hydrofluoric Acid
In Situ Infrared Spectroscopy on the Wet Chemical Oxidation of Hydrogen-Terminated Si Surfaces
Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy

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