Yamazaki Tatsuya | FUJITSU LABORATORIES LTD.

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著作論文

Fabrication and Delay Time Analysis of Deep Submicron CMOS Devices
Ti Salicide Process for Subquarter-Micron CMOS Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality silicon Epitaxy : Beam Induced Physics and Chemistry
High-Speed SOI Bipolar Transistors Using Bonding and Thinning Techniques
Achieving High Current Gain and Low Emitter Resistance with the SiC_x:F Widegap Emitter
Oxynitride Pad LOCOS (ON-LOCOS) Isolation Technology for Gigabit DRAMs
Key Issues for Manufacturable FeRAM Devices : Novel 0.35um FRAM Technology using Triple Level Aluminum Layer for High Speed and Low Voltage Operation
Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy

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