Ti Salicide Process for Subquarter-Micron CMOS Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
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概要
- 論文の詳細を見る
Using Ti self-aligned silicide (salicide) process, we fabricated subquarter-micron complementary metal-oxide semiconductor (CMOS) devices, and studied the mechanism of increasing resistivity of TiSi_2 on poly-Si gates from 0.075 to 20 μm long and 10 μm wide. In the gates less than 0.1 μm long, we found that agglomeration of TiSi_2 takes place during low temperature annealing at 675℃ for 30 seconds leading to discontinuous TiSi_2 lines. The discontinuity of TiSi_2 abruptly increases the gate resistance, and remarkably reduces the circuit speed of CMOS ring oscillators. On the other hand, Raman spectroscopy reveals that the phase transition from high-resistivity C49 to low-resistivity C54 occurs in plane TiSi_2 by annealing at 800℃ for 30 seconds, while it does not occur in TiSi_2 gates less than 5 μm long. From these results we found that the gate sheet resistance can not be reduced to less than 5 Ω/sq by conventional Ti salicide technology in gates shorter than 0.4 μm due to increase in gate resistance caused by agglomeration and lack of phase transition.
- 社団法人電子情報通信学会の論文
- 1994-03-25
著者
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Nara Yasuo
Department Of Pharmacy School Of Pharmacy Shujitsu University
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Nara Yasuo
就実大学 薬学部応用薬学
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Nara Yasuo
武庫川女子大学
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Yamori Y
Institute For World Health Development Mukogawa Women's University
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Nara Y
Fujitsu Lab. Ltd. Atsugi Jpn
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ITO Takashi
Fujitsu Laboratories Ltd.
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Nara Y
Univ. East Asia Shimonoseki Jpn
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Nara Yasuo
Fujitsu Laboratories Ltd.
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GOTO Ken-ichi
FUJITSU Ltd.
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SUGII Toshihiro
FUJITSU LABORATORIES LTD.
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ARIMOTO Yoshihiro
Fujitsu Laboratories Ltd.
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Yamazaki Tatsuya
FUJITSU LABORATORIES LTD.
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Fukano Tetsu
FUJITSU LABORATORIES LTD.
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Goto K
Kdd Headquarters Tokyo Jpn
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Goto Ken-ichi
Fujitsu Laboratories Ltd.
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Sugii T
Fujitsr Ltd. Akiruno-shi Jpn
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ARIMOTO Yoshihiro
System LSI Development Labs., FUJITSU LABORATORIES LTD.
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Yamazaki T
Atr Adaptive Communications Research Laboratories:(present Address)communications Research Laborator
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Ito T
Department Of Chemical Engineering Graduate School Of Engineering Nagoya University
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Arimoto Y
System Lsi Development Labs. Fujitsu Laboratories Ltd.
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