Nara Yasuo | Fujitsu Laboratories Ltd.
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概要
関連著者
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Nara Yasuo
Fujitsu Laboratories Ltd.
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Nara Yasuo
Department Of Pharmacy School Of Pharmacy Shujitsu University
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Nara Yasuo
就実大学 薬学部応用薬学
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Nara Yasuo
武庫川女子大学
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Nara Y
Univ. East Asia Shimonoseki Jpn
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Yamori Y
Institute For World Health Development Mukogawa Women's University
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ITO Takashi
Fujitsu Laboratories Ltd.
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Itakura T
Fujitsu Lab. Ltd. Atsugi Jpn
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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Sugita Yutaka
Research Institute Of Electrical Communication Tohoku University
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Sugita Yutaka
Hitachi Research Laboratory Hitachi Lid.
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Sugita Y
Department Of Physics Toyama University
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Nara Y
Fujitsu Lab. Ltd. Atsugi Jpn
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Yamazaki Tatsuya
FUJITSU LABORATORIES LTD.
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Nakayama Noriaki
Fujitsu Laboratories Ltd.
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Nakayama Noriaki
Semiconductor Technology Academic Research Center (starc)
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Nakayama Noriaki
Department Of Advanced Materials Science And Engineering Faculty Of Engineering
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Nakayama Noriaki
Fujitsu Laboratories Lid.
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SUGINO Rinshi
Fujitsu Laboratories Lid.
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SUGII Toshihiro
FUJITSU LABORATORIES LTD.
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Yamazaki T
Atr Adaptive Communications Research Laboratories:(present Address)communications Research Laborator
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Ito T
Department Of Chemical Engineering Graduate School Of Engineering Nagoya University
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AOYAMA Takayuki
Fujitsu Laboratories Lid.
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GOTO Ken-ichi
FUJITSU Ltd.
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HORIUCHI Kei
Fujitsu Laboratories Ltd.
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ARIMOTO Yoshihiro
Fujitsu Laboratories Ltd.
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Fukano Tetsu
FUJITSU LABORATORIES LTD.
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TANAKA Tetsu
Fujitsu Laboratories Ltd.
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Goto K
Kdd Headquarters Tokyo Jpn
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Horiuchi K
Fujitsu Laboratories Ltd.
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Horiuchi Kei
Fujitsu Laboratories
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Goto Ken-ichi
Fujitsu Laboratories Ltd.
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Sugino Rinshi
Fujitsu Laboratories Ltd.
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KOJIMA Manabu
Fujitsu Laboratories Ltd.
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Sugii T
Fujitsr Ltd. Akiruno-shi Jpn
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ARIMOTO Yoshihiro
System LSI Development Labs., FUJITSU LABORATORIES LTD.
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Arimoto Y
System Lsi Development Labs. Fujitsu Laboratories Ltd.
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Watanabe Satoru
Fujita Health University
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OHTAKE Fumio
Fujitsu Laboratories Ltd.
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Takahashi K
Department Of Physical Electronics Tokyo Institute Of Technology
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Takahashi K
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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TAKAHASHI Kaoru
Department of Applied Physics, Tokyo University of Agriculture and Technology
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Imai M
Univ. Osaka Prefecture Sakai
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Horie H
Fujitsu Lab. Ltd. Atsugi Jpn
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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SUZUKI Kunihiro
Fujitsu Laboratories Ltd.
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Katsumata Ryota
Toshiba Corporation
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Suzuki Kunihiro
Department Of Histology Cytology And Developmental Anatomy Nihon University School Of Dentistry At M
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Suzuki K
Oki Electric Ind. Co. Ltd. Hachioji‐shi Jpn
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Takahashi K
Department Of Physical Electronics Tokyo Institute Of Tecnology
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Takahashi K
Tokyo Inst. Technol. Yokohama Jpn
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ITOH Akio
Fujitsu Laboratories Ltd.
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Deura Manabu
FUJITSU LABORATORIES LTD.
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Tanaka Tsuyoshi
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
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SUGIZAKI Taro
FUJITSU LABORATOIRES Ltd.
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NAKANISHI Toshiro
FUJITSU LABORATOIRES Ltd.
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Takahashi Kensuke
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Terahara Takafumi
The Authors Are With Optoelectronic Systems Laboratory Network System Laboratories Fujitsu Laborator
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Takahashi Kuniharu
Graduate School Of Science And Technology Niigata University
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Takahashi Kazuhiko
National Research Institute For Metals Tsukuba Laboratories:sanyo Elect. Co. Ltd.
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Takahashi Kouchiro
National Institute For Research In Inorganic Materials
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Itakura Toru
Fujitsu Laboratories Ltd.
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Tanaka T
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
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NAKAJIMA Anri
Fujitsu Laboratories Ltd.
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Itoh A
Ricoh Co. Ltd. Miyagi Jpn
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HORIE Hiroshi
Fujitsu Laboratories Ltd.
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NAKAMURA Shunji
Fujitsu Laboratories Ltd.
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IMAI Masahiko
Fujitsu Laboratories Ltd.
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HOSHINO Hiromi
Fujitsu Ltd.
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MACHIDA Yasuhide
Fujitsu Ltd.
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TAKAHASHI Kimitoshi
Fujitsu Laboratories Ltd.
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MANABE Yasuo
Fujitsu Limited
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Nakajima A
Kaneka Corporation
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Itakura Toru
Fujitsu Laboratories Ltd
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Manabe Y
Fujitsu Ltd. Kawasaki Jpn
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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YAMAGISHI Hiroaki
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Takahashi Kasuke
National Laboratory For High Energy Physics
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Yamagishi Hiroaki
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Itoh A
Fujitsu Laboratories Ltd.
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MURAKOSHI Atsushi
Toshiba Corporation
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Arimoto Hiroshi
Fujitsu Laboratories Limited
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Hoshino H
Fujitsu Ltd.
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Takahashi Katsuaki
Department Of Applied Chemistry Okayama University
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M0SCHENI Fabrice
Fujitsu Laboratories Ltd.
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TAKASE Kazuhiko
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Asano Koji
Fujitsu Laboratories Ltd.
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NAGATA Takeo
Fujitsu Laboratories Ltd.
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SATO Masami
Fujitsu Laboratories Ltd.
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KURATA Hajime
Fujitsu Laboratories Ltd.
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SUZUKI Hiroshi
Fujitsu Laboratories Ltd.
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Takase Kazuhiko
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Machida Yasuhide
Fujitsu Limited
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Watanabe Satoru
Fujitsu Laboratories Ltd
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TAKAHASHI Kenji
Semiconductor Research Laboratory, Pioneer Electronic Corporation
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Aoyama Takayuki
FUJITSU LABORATORIES LTD., 50 Fuchigami, Akiruno 197-0833, Japan
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Katsumata Ryota
Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Tanaka Tetsu
Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Hoshino Hiromi
Fujitsu Limited
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Nara Yasuo
Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Suzuki Kunihiro
Fujitsu Laboratories Limited., 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan
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Yamazaki Tatsuya
FUJITSU LABORATORIES LTD., 10-1 Morinosato-Wakamiya, Atsugi 243-01
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Sugino Rinshi
FUJITSU LABORATORIES LTD., 10-1 Morinosato-Wakamiya, Atsugi 243-01
著作論文
- Fabrication and Delay Time Analysis of Deep Submicron CMOS Devices
- Ti Salicide Process for Subquarter-Micron CMOS Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
- Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality silicon Epitaxy : Beam Induced Physics and Chemistry
- Advanced SOI Devices Using CMP and Wafer Bonding
- Coulomb Interaction Effect Correction in Electron-Beam Block Exposure Lithography
- Quantum-Size Effect from Photoluminescence of Low-Temperature-Oxidized Porous Si
- Synchrotron-Radiation-Induced Modification of Silicon Dioxide Film at Room Temperature : Beam Induced Physics and Chemistry
- Synchrotron-Radiation-Induced Modification of Silicon Dioxide Film at Room Temperature
- Synchrotron Radiation-Assisted Removal of Oxygen and Carbon Contaminants from a Silicon Surface
- Evaluation of Photoemitted Current from SiO_2 Film on Silicon During Synchrotron Radiation Irradiation
- Chemical Structures of Native Oxides Formed during Wet Chemical Treatments
- Synchrotron Radiation-Assisted Silicon Film Growth by Irradiation Parallel to the Substrate
- Evaluation of Shot Position Error in Electron Beam Lithography Using Overlay Metrology with 'One-Shot' Inspection Mark
- Impact Ionization in 0.1 μm Metal-Oxide-Semiconductor Field-Effect Transistors
- Trap Assisted Leakage Mechanism of 'worst' Junction in Giga-bit DRAM Using Negative Word-Line Voltage
- Impact of Metal Gate/High-k Interface in Mo Metal Gated MOSFETs with HfO_2 Gate Dielectrics
- Low Contact Resistance Poly-Metal Gate CMOS Using TiN/Thin TiSi_2/Poly-Si Structure
- Low-Contact Resistance Poly-Metal Gate Electrode Using TiN/Thin TiSi_2/Poly-Si Structure
- Process Integration Issues on Mo-Metal-Gated MOSFETs with HfO2 High-k Gate Dielectrics
- Highly Reliable Dynamic Random Access Memory Technology for Application Specific Memory with Dual Nitrogen Concentration Gate Oxynitrides Using Selective Nitrogen Implantation
- Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy