KOJIMA Manabu | Fujitsu Laboratories Ltd.

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概要

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著作論文

Scenario of Source/Drain Extension and Halo Engineering for High Performance 50nm SOI-pMOSFET
Advanced Input/Output Technology Using Laterally Modulated Channel Metal–Oxide–Semiconductor Field Effect Transistor for 65-nm Node System on a Chip
High-Speed SOI Bipolar Transistors Using Bonding and Thinning Techniques
A New SOI-Lateral Bipolar Transistor for High-Speed Operation
Trap Assisted Leakage Mechanism of 'worst' Junction in Giga-bit DRAM Using Negative Word-Line Voltage
Highly Reliable Dynamic Random Access Memory Technology for Application Specific Memory with Dual Nitrogen Concentration Gate Oxynitrides Using Selective Nitrogen Implantation

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