Chemical Structures of Native Oxides Formed during Wet Chemical Treatments
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概要
- 論文の詳細を見る
The chemical structures of the native oxides formed during various wet chemical treatments were measured nondestructively by changing the effective electron escape depth. The structures of the native oxides can be characterized by the distribution of suboxide Si^<3+> in the native oxide films. If Si^<3+> is correlated with Si-H bonds, the formation rate of the native oxide during the wet chemical treatment and the interface roughness produced by photoexcited dry etching through the oxide can be explained.
- 社団法人応用物理学会の論文
- 1989-02-20
著者
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Nara Yasuo
Department Of Pharmacy School Of Pharmacy Shujitsu University
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Nara Yasuo
就実大学 薬学部応用薬学
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Nara Yasuo
武庫川女子大学
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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ITO Takashi
Fujitsu Laboratories Ltd.
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Nara Y
Univ. East Asia Shimonoseki Jpn
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Nara Yasuo
Fujitsu Laboratories Ltd.
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SUGINO Rinshi
Fujitsu Laboratories Lid.
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Sugino Rinshi
Fujitsu Laboratories Ltd.
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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YAMAGISHI Hiroaki
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Yamagishi Hiroaki
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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TAKASE Kazuhiko
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Ito T
Department Of Chemical Engineering Graduate School Of Engineering Nagoya University
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Takase Kazuhiko
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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