Electron Tunneling through Chemical Oxide of Silicon
スポンサーリンク
概要
- 論文の詳細を見る
- 1995-08-21
著者
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WATANABE Kunihiro
Department of Radiology, Saitamaken Saiseikai Kurihashi Hospital
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Matsuda M
Muroran Institute Of Technology
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Matsuda M
Electrotechnical Laboratory:(present Address) Muroran Institute Of Technology
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Matsuda M
Tohoku Univ. Sendai Jpn
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Matsuda Motohide
Department Of Electrical Engineering Nagaoka University Of Technology
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Hattori T
New Industry Creation Hatchery Center Tohoku University
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MATSUDA MASANORI
Department of Surgery, School of Medicine, Yamanashi Medical University
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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Matsuda Masanori
Department Of Physics Faculty Of General Education Hiroshima University
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YASUTAKE Masatoshi
Scientific Instruments Division, Development Department, Seiko Instruments Inc.
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Watanabe Kunihiro
Department Of Chemical Industry Science University Of Tokyo
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Yasutake M
Seiko Instruments Inc. Shizuoka Jpn
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Yasutake Masatoshi
Scientific Instruments Division Development Department Seiko Instruments Inc.
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Watanabe Kunihiro
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Matsuda Masanori
Department Of Chemistry Faculty Of Integrated Arts And Sciences University Of Osaka Prefecture
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