Electron Tunneling through Chemical Oxide of Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-05-15
著者
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SAITO Kenji
Department of Hematology, Dokkyo Medical School of Medicine
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Matsuda M
Muroran Institute Of Technology
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Matsuda M
Electrotechnical Laboratory:(present Address) Muroran Institute Of Technology
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Matsuda M
Tohoku Univ. Sendai Jpn
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Matsuda Motohide
Department Of Electrical Engineering Nagaoka University Of Technology
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Saito Kenji
Department Of Applied Chemistry Faculty Of Science Tokyo University Of Science
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MATSUDA MASANORI
Department of Surgery, School of Medicine, Yamanashi Medical University
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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Matsuda Masanori
Department Of Physics Faculty Of General Education Hiroshima University
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YASUTAKE Masatoshi
Scientific Instruments Division, Development Department, Seiko Instruments Inc.
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Yasutake M
Seiko Instruments Inc. Shizuoka Jpn
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Yasutake Masatoshi
Scientific Instruments Division Development Department Seiko Instruments Inc.
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Hattori Takeo
Faculty Of Engineering Musashi Institute Of Technology
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Matsuda Masanori
Department Of Chemistry Faculty Of Integrated Arts And Sciences University Of Osaka Prefecture
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SAITO Kenji
Department of Applied Biological Chemistry Graduate School of Agricultural and Life Sciences, The University of Tokyo
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