Optical Absorption in Ultrathin Silicon Oxide Film (SOLID STATE DEVICES AND MATERIALS 1)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-11-20
著者
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HAGA Tetsuya
Department of Applied Physics, Hokkaido University
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Haga T
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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MORIKI Kazunori
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Matsukawa Takayuki
LSI Research and Development Laboratory, Mitsubishi Corporation
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Fujisawa Masami
Institute For Solid State Physics University Of Tokyo
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Fujisawa Masami
Synchrotron Radiation Laboratory The Institute For Solid State Physics University Of Tokyo
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Fujisawa Masami
The Institute For Solid State Physics The University Of Tokyo
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Fujisawa Masami
The Synchrotron Radiation Laboratory The Institute For Solid State Physics The University Of Tokyo
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MIYATA Noriyuki
Department of Pharmacology, School of Pharmacy, Hoshi University
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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Matsukawa T
National Institute Of Advanced Industrial Science And Technology
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MORIKI Kazunori
Musashi Institute of Technology
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HIRAYAMA Makoto
LSI Research and Development Laboratory, Mitsubishi Electric Corporation
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Moriki K
Musashi Institute Of Technology
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Moriki Kazunori
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Hirayama M
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama Makoto
Lsi R & D Lab. Mitsubishi Electric Co.
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Hirayama Makoto
Lsi R&d Lab. Mitsubishi Electric Corp.
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Miyata N
Fujitsu Lab. Ltd. Atsugi Jpn
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Matsukawa T
Lsi Research And Development Laboratory Mitusbishi Electric Corporation
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