Fabrication of a Nanometer-Scale Si-Wire by Micromachining of a Silicon-on-Insulator Substrate
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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MATSUKAWA Takashi
National Institute of Advanced Industrial Science and Technology
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ITOH Junji
Electrotechnical Laboratory
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YOKOYAMA Hiroshi
Electrotechnical Laboratory
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KANEMARU Seigo
Electrotechnical Laboratory
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Fujii Hideo
Core Research For Evolutional Science And Technology Program (crest) Japan Science And Technology Co
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MATSUKAWA Takashi
Electrotechnical Laboratory
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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HIROSHIMA Hiroshi
Electrotechnical Laboratory
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Itoh J
Aist Ibaraki Jpn
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Itoh J
Nanoelectronics Research Institute Aist
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Itoh Junji
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Matsukawa T
National Institute Of Advanced Industrial Science And Technology
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FUJII Hideo
Kobe Steel Ltd.
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Yokoyama H
Ntt Corp. Kanagawa Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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