Fabrication of Si Field Emitter Tip for a Three-Dimensional Vacuum Magnetic Sensor
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概要
- 論文の詳細を見る
A new Si field emitter tip generating a cross-shaped electron beam was fabricated for a three-dimensional vacuum magnetic sensor (VMS) application. The present tip is surrounded by a gate for field emission, and a focusing lens is made in the same plane as the gate. The beam current of about 50 nA was obtained with a single tip at the gate and lens voltages of 55 V and 10 V, respectively. The fabrication process and beam characteristics are described. Preliminary results such as linearity and sensitivity of VMS using the present tip are also discussed.
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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ITOH Junji
Electrotechnical Laboratory
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KANEMARU Seigo
Electrotechnical Laboratory
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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Itoh J
Aist Ibaraki Jpn
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Itoh J
Nanoelectronics Research Institute Aist
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Itoh Junji
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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UEMURA Koji
Tsukuba Laboratory, Yaskawa Electric Co., Ltd.
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Uemura Kamon
Sony Corporation
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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