A Method to Compensate Decay of Power in SR Lithography
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概要
- 論文の詳細を見る
A method to compensate the synchrotron radiation power decrease due to the stored current decay by increasing the stored electron energy is described. The absorbed power in a resist can be held constant by about a 10 percent increase of the electron energy, compensating the beam current decrease of 50 percent. The throughput decrease is 10 percent owing to power suppression in order to maintain constant absorbed power.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-11-20
著者
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Atoda Nobufumi
Electrotechnical Laboratory
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ITOH Junji
Electrotechnical Laboratory
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Matsuo Koji
Sortec Corporation
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HASEGAWA Shinya
SORTEC Corporation
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Itoh Junji
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki 305
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Matsuo Koji
SORTEC Corporation, 16-1, Wadai, Tsukuba, Ibaraki 300-42
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