Novel Process for High-Density Buried Nanopyramid Array Fabrication by Means of Dopant Ion Implantation and Wet Etching
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-01
著者
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Tanii T
Waseda Univ. Tokyo Jpn
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Ohdomari Iwao
Kagami Memorial Laboratory For Material Science And Technology Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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Tanii Takashi
Department Of Electronics Information And Communication Engineering School Of Science And Engineerin
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Iida T
Department Of Electrical And Electronic Systems Saitama University:(present)nec Electron Devices Nec
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Goto Tomomi
Department of Toxicology, Aichi Prefectural Institute of Public Health
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KOH Meishoku
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University
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SUGITA Atsushi
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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IIDA Tomoyuki
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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SHINADA Takahiro
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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MATSUKAWA Takashi
Electrotechnical Laboratory
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Matsukawa T
National Institute Of Advanced Industrial Science And Technology
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