Influence of Secondary Electron Detection Efficiency on Controllability of Dopant Ion Number in Single Ion Implantation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-06-15
著者
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Ohdomari Iwao
Kagami Memorial Laboratory For Material Science And Technology Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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Yamashita Keisuke
Department of Anatomy and Developmental Biology, Graduate School of Biomedical Sciences, Hiroshima U
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SHINADA Takahiro
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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FUJITA Makoto
Department of Applied Chemistry, School of Engineering Nagoya University
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ISHIKAWA Atsuki
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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Yamashita Keisuke
Department Of Electronics Information And Communication Engineering School Of Science And Engineerin
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Fujita Makoto
Department Of Applied Chemistry Faculty Of Engineenng Chiba University
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Yamashita Keisuke
Department Of Anatomy And Developmental Biology Graduate School Of Biomedical Sciences Hiroshima Uni
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OHDOMARI Iwao
Kagami Memorial Laboratory for Material Science and Technology, Waseda University
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Shinada Takahiro
Department of Chemistry, Nagaoka University of Technology
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SHINADA Takahiro
Department of Electronics, Information and Communication Engineering, School of Science and Engineering, Waseda University
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YAMASHITA Keisuke
Department of Electronics, Information and Communication Engineering, School of Science and Engineering, Waseda University
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ISHIKAWA Atsuki
Department of Electronics, Information and Communication Engineering, School of Science and Engineering, Waseda University
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