Improvement of Focused Ion-Beam Optics in Single-Ion Implantation for Higher Aiming Precision of One-by-One Doping of Impurity Atoms into Nano-Scale Semiconductor Devices : Instrumentation, Measurement, and Fabrication Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-03-01
著者
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Ohdomari Iwao
Kagami Memorial Laboratory For Material Science And Technology Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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SHINADA Takahiro
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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KOYAMA Hikaru
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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HINOSHITA Chie
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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IMAMURA Ken
Department of Electronics, Information and Communication Engineering, School of Science and Engineer
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Imamura Ken
Department Of Electronics Information And Communication Engineering School Of Science And Engineerin
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Koyama Hikaru
Department Of Electronics Information And Communication Engineering School Of Science And Engineerin
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Hinoshita Chie
Department Of Electronics Information And Communication Engineering School Of Science And Engineerin
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Shinada T
Department Of Chemistry Nagaoka University Of Technology
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Shinoda Takahiro
Department of Electronics, Information and Communication Engineering, School of Science and Engineering, Waseda University
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