Optical Absorption in Silicon Oxide Film Near the SiO_2/Si Interface

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-12-20

著者

• HAGA Tetsuya

  Department of Applied Physics, Hokkaido University

• Haga T

  Ntt Telecommunications Energy Lab. Kanagawa Jpn

• HATTORI Takeo

  Musashi Institute of Technology

• Matsukawa Takayuki

  LSI Research and Development Laboratory, Mitsubishi Corporation

• Fujisawa Masami

  Institute For Solid State Physics University Of Tokyo

• Fujisawa Masami

  Synchrotron Radiation Laboratory The Institute For Solid State Physics University Of Tokyo

• Fujisawa Masami

  The Institute For Solid State Physics The University Of Tokyo

• Fujisawa Masami

  The Synchrotron Radiation Laboratory The Institute For Solid State Physics The University Of Tokyo

• Matsukawa T

  National Institute Of Advanced Industrial Science And Technology

• HAGA Takashi

  Musashi Institute of Technology

• MIYATA Noriyuki

  Musashi Institute of Technology

• MORIKI Kazunori

  Musashi Institute of Technology

• KANEOKA Tatsunori

  LSI Research and Development Laboratory, Mitsubishi Electric Corporation

• HIRAYAMA Makoto

  LSI Research and Development Laboratory, Mitsubishi Electric Corporation

• Moriki K

  Musashi Institute Of Technology

• Hirayama M

  Ulsi Laboratory Mitsubishi Electric Corporation

• Hirayama Makoto

  Lsi R & D Lab. Mitsubishi Electric Co.

• Hirayama Makoto

  Lsi R&d Lab. Mitsubishi Electric Corp.

• Kaneoka Tatsunori

  Lsi Research And Development Laboratory Mitsubishi Electric Corporation

• Miyata N

  Fujitsu Lab. Ltd. Atsugi Jpn

• Matsukawa T

  Lsi Research And Development Laboratory Mitusbishi Electric Corporation

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