Refractive Index Distribution in Photoresist Thin Film Formed by the Spin Coating Method
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概要
- 論文の詳細を見る
By measuring refractive index distribution in a wafer, we discuss the characteristic change of resist film. By various treatments including baking and dipping into a solution, the refractive index distribution differs slightly from that of the resist thickness in a wafer. We analyze the refractive index variation based on the Clausius-Mossotti relation of a solid.
- 社団法人応用物理学会の論文
- 1997-12-01
著者
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Yasuoka Akihiko
Ulsi Laboratory Mitsubishi Electric Corporation
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Kawai Akira
Department Of Orthopaedic Surgery National Cancer Center Hospital
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Wakamiya W
Ulsi Development Center Mitsubishi Electric Corporation
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Wakamiya Wataru
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama M
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama Makoto
Lsi R&d Lab. Mitsubishi Electric Corp.
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Hirayama Makoto
Ulsi Laboratory Mitsubishi Electric Corporation
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Kawai Akira
Department Of Electrical Engineering Nagaoka University Of Technology
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Wakamiya Wataru
ULSI Development Center, Mitsubishi Electric Corporation
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