Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask

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0.10 μm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light
Simple Method for Resist Critical Dimension Prediction
Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask
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Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask
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単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕
Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape

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