0.10 μm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light

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Orientation of Vanadyl Phthalocyanine Grown by Molecular Beam Epitaxy on KBr-KCl Mixed Crystals with Various Lattice Constants
Proposal of a Next-Generation Super Resolution Technique
Growth by Molecular Beam Epitaxy of Vanadyl Phthalocyanine on Alkali-Substituted Alkali-Halide Mixed Crystal Substrates
Two-Step Epitaxial Growth of Vanadyl-Phthalocyanine on Alkali-Halide Substrates
Molecular Orbital Study of the Adsorption of Chloroaluminum Phthalocyanine on a NaCl (100) Surface
Influence of Lattice Misfit on Surface Morphology of Vanadyl-Phthalocyanine Molecular Beam Epitaxy Films Grown on KCI/KBr Mixed-Crystal Substrates
Lattice Matching and Relaxation of Vanadyl-Phthalocyamine Crystal Epitaxially Growm on Mixed Crystals of Alkali Halides
Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
Characterization of Neutron Elastic Recoil Detection Analysis with Low-Energy Neutron Beams
Annealing of Silica Glasses Implanted with High-Energy Copper Ions
Effect of High-Energy Carbon Ion Irradiation in Aligned and Random Directions on Microstructure of (111) Au Films
Damage Production and Reduction of Single-Crystalline TiN Films by 1.8 MeV Carbon Beam Irradiation
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Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
New Dry Surface-Imaging Process for X-Ray Lithography
Effect of Anion in Developer on Dissolution Characteristics of Photoresist : Resist Material and Process
Effect of Anion in Developer on Dissolution Characteristics of Photoresist
Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
Improvement of Dry Etching Resistance of Resists by Deep UV Cure
Characterization of Thin-Film Interference Effect due to Surface Roughness
Practical Properties of Thermochromically Induced Super-Resolution Read-Only Memory Disk (TSR-ROM)
Thermochromic Super-Resolution in Phase-Change Rewritable Disk with Double Mask Layer
Hydrogen-Etching Effect of Substrate on Deposition of Diamond Films by DC Plasma Chemical Vapor Deposition
Effect of Discharge Current on the Microstructure of Diamond Films Deposited on Aluminum Substrate at Low Substrate Temperature by DC Plasma CVD
Deposition of Diamond onto an Aluminum Substrate by DC Plasma CVD
Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern
Analysis of Line-edge Roughness in Resist Patterns and Its Transferability as Origins of Device Performance Degradation and Variation
0.10 μm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light
Simple Method for Resist Critical Dimension Prediction
Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask
Super-Resolution Rewritable Optical Disk Having a Mask Layer Composed of Thermo-Chromic Organic Dye
Characterization of Line-Edge Roughness in Cu/Low-$k$ Interconnect Pattern
Imaging Characteristics of 0.12 μm Dynamic Random Access Memory Pattern by KrF Excimer Laser Lithography
Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask
Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask
Quantitative Measurement of the Ray Shift Aspect of Coma Aberration Utilizing Electrical Probe with Zero-Crossing Method
Refractive Index Distribution in Photoresist Thin Film Formed by the Spin Coating Method
Adhesion Improvement of Photoresist on TiN/Al Multilayer by Ozone Treatment
単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕
Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape
Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
Characterization of Line Edge Roughness in Resist Patterns by Using Fourier Analysis and Auto-Correlation Function
Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation
Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation (Special Issue : Microprocesses and Nanotechnology)

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