Hydrogen-Etching Effect of Substrate on Deposition of Diamond Films by DC Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-07-01
著者
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野田 三喜男
愛知教大
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Noda M
Department Of Electronics Fukuoka Institute Of Technology
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Noda Mikio
Department of Integrated Natural Sciences, Aichi University of Education
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MARUNO Shigemitsu
The Institute of Scientific and Industrial Research, Osaka University
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Nakao S
National Industrial Research Institute Of Nagoya
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MARUNO Shigeo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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NAKAO Setsuo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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WATATANI Hirohumi
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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Maruno S
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Maruno Shigeo
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Watatani Hirohumi
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Maruno Shigemitsu
Advanced Technology R&D Center. Mitsubishi Electric Corporation
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