Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask

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単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕
Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape

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