単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕

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Proposal of a Next-Generation Super Resolution Technique
X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
Organotin-Containing Resists (TMAR) for X-Ray Lithography : Resist Material and Process
Organotin-Containing Resists (TMAR) for X-Ray Lithography
Sputtered W-Ti Film for X-Ray Mask Absorber
Fabrication of 0.25-μm Pattern on a Membrane Substrate-Based X-Ray Absorber : X-Ray Lithography
Fabrication of 0.25-μm Patterns on a Membrane Substrate-Based X-Ray Absorber
0.10 μm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light
Simple Method for Resist Critical Dimension Prediction
Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask
Imaging Characteristics of 0.12 μm Dynamic Random Access Memory Pattern by KrF Excimer Laser Lithography
Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask
Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask
Quantitative Measurement of the Ray Shift Aspect of Coma Aberration Utilizing Electrical Probe with Zero-Crossing Method
Refractive Index Distribution in Photoresist Thin Film Formed by the Spin Coating Method
Adhesion Improvement of Photoresist on TiN/Al Multilayer by Ozone Treatment
単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕
Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape

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