Fabrication of 0.25-μm Pattern on a Membrane Substrate-Based X-Ray Absorber : X-Ray Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• Hashimoto M

  Department Of Macromolecular Science And Engineering Graduate School Of Science And Technology Kyoto

• Hashimoto M

  Department Of Polymer Science And Engineering Faculty Of Textile Science Kyoto Institute Of Technolo

• MORIIZUMI Koichi

  LSI R&D Laboratory, Mitsubisi Electric Corporation

• FUJINO Takeshi

  LSI R&D Laboratory, Mitsubisi Electric Corporation

• MORIMOTO Hiroaki

  LSI R&D Laboratory, Mitsubisi Electric Corporation

• Fujino Takeshi

  Wood Research Institute, Kyoto University

• Fujino T

  Information Technology R&d Center Mitsubishi Electric Corporation:communication Systems R&d

• Fujino T

  Wood Research Institute Kyoto University

• Fujino Takeshi

  Department Of Electric And Electronic Engineering Ritsumeikan University

• YOSHIOKA Nobuyuki

  LSI R&D Lab, Mitsunishi Electric Corporation

• Moriizumi K

  Mitsubishi Electric Corp. Hyogo Jpn

• HASHIMOTO Motoko

  Central Research Laboratory, Mitsubishi Electric Corporation

• SATOU Tetsuo

  LSI R&D Laboratory, Mitsubishi Electric Corporation

• WATANABE Yaichiro

  LSI R&D Laboratory, Mitsubishi Electric Corporation

• Satou Tetsuo

  Lsi R&d Laboratory Mitsubishi Electric Corporation

• Watakabe Y

  Mitsubishi Electric Corp. Itami

• Morimoto H

  Semiconductor Leading Edge Technologies Inc.

• YOSHIOKA Nobuyuki

  ULSI Laboratory, Mitsubishi Electric Corporation

• Yoshioka N

  Shizuoka Univ. Hamamatsu Jpn

• Yoshioka Nobuyuki

  Lsi R & D Laboratory Mitsubishi Electric Corporation

• MORIIZUMI Koichi

  LSI R&D Laboratory, Mitsubishi Electric Corporation

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