Sputtered W-Ti Film for X-Ray Mask Absorber

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-12-30

著者

• FUJINO Takeshi

  LSI R&D Laboratory, Mitsubisi Electric Corporation

• WATAKABE Yaichiro

  LSI R&D Laboratory, Mitsubisi Electric Corporation

• MARUMOTO Kenji

  Central Research Laboratory, Mitsubishi Electric Corporation

• YABE Hideki

  Central Research Laboratory, Mitsubishi Electric Corporation

• Fujino Takeshi

  Wood Research Institute, Kyoto University

• MATSUI Yasuji

  Central Research Laboratory, Mitsubishi Electric Corp.

• Fujino T

  Information Technology R&d Center Mitsubishi Electric Corporation:communication Systems R&d

• Fujino T

  Wood Research Institute Kyoto University

• Fujino Takeshi

  Department Of Electric And Electronic Engineering Ritsumeikan University

• YOSHIOKA Nobuyuki

  LSI R&D Lab, Mitsunishi Electric Corporation

• Aya S

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Yabe H

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Yabe Hideki

  Central Research Laboratory Mitsubishi Electric Corp.

• Marumoto K

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• AYA Sunao

  Central Research Laboratory, Mitsubishi Electric Corporation

• Watakabe Y

  Mitsubishi Electric Corp. Itami

• Matsui Yasuji

  O Ntt Lsi Laboratories

• Matsui Yasuji

  Central Research Laboratory Mitsubishi Electric Corp.

• YOSHIOKA Nobuyuki

  ULSI Laboratory, Mitsubishi Electric Corporation

• Watakabe Yaichiro

  Lsi R & D Laboratory Mitsubishi Electric Corporation

• Yoshioka N

  Shizuoka Univ. Hamamatsu Jpn

• Yoshioka Nobuyuki

  Lsi R & D Laboratory Mitsubishi Electric Corporation

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• 単層ハ-フト-ン型位相シフトマスクによるリソグラフィ-特性〔英文〕
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