Fujino Takeshi | Department Of Electric And Electronic Engineering Ritsumeikan University

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著作論文

A Low Power Embedded DRAM Macro for Battery-Operated LSIs(Power Optimization)(VLSI Design and CAD Algorithms)
Electron Beam Direct Writing Technologies for 0.3-μm ULSI Devices : Lithography Technology
Electron Beam Direct Writing Technologies for 0.3-μm ULSI Devices
A 0.18 ★m 32 Mb Embedded DRAM Macro for 3-D Graphics Controller
X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
Characterization of Cross-Links between Cellulose Microfibrils, and Their Occurrence during Elongation Growth in Pea Epicotyl
Analysis of the xyloglucan cross-links in the cell wall of pea
Distereoselective Formation of Disaccharides from(RS)-1- Phenylethanol by Cultured Cells of Catharanthus roseus
Regular Fabric of Via Programmable Logic Device Using EXclusive-or Array (VPEX) for EB Direct Writing
Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
Application of Proximity Effect Correction Usirng Pattern-Area Density to Patterning on a Heavy-Metal Substrate and the Cell-Projection Exposure
Sputtered W-Ti Film for X-Ray Mask Absorber
Fabrication of 0.25-μm Pattern on a Membrane Substrate-Based X-Ray Absorber : X-Ray Lithography
Fabrication of 0.25-μm Patterns on a Membrane Substrate-Based X-Ray Absorber
Characterization and Environmental Regulation of a 24 kDa Cornus sericea Dehydrin-like Protein and its Relationship to Freeze-Tolerance (セミナーストレスと生物の応答・適応--その分子・細胞機構と応用)
The effects of predation risk and current velocity stress on growth, condition and swimming energetics of Japanese minnow (Pseudorasbora parva)

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