Nakao Shuji | Ulsi Laboratory Mitsubishi Electric Corporation

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著作論文

Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
0.10 μm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light
Simple Method for Resist Critical Dimension Prediction
Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask
Imaging Characteristics of 0.12 μm Dynamic Random Access Memory Pattern by KrF Excimer Laser Lithography
Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask
Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask
Quantitative Measurement of the Ray Shift Aspect of Coma Aberration Utilizing Electrical Probe with Zero-Crossing Method
Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape

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