Quantitative Measurement of the Ray Shift Aspect of Coma Aberration Utilizing Electrical Probe with Zero-Crossing Method

概要

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A novel quantitative measurement method of the ray shift aspect of coma aberration utilizing an electrical probe is proposed, based on the optical image calculations. The printed width difference of two parallel lines caused by a coma aberration is compensated by changing the mask width of the one line and fixing that of the other. Using an electrical probe, the printed width difference of the two lines can be converted to the output voltage. Plotting the voltage with the mask width difference and determining the zero-crossing point by interpolation, the effective coma aberration coefficient can be obtained quantitatively. The accuracy of the measured aberration coefficient and the minimum detectable aberration are estimated to be less than 〜0.01 λ.
社団法人応用物理学会の論文
1998-12-30