Adhesion Improvement of Photoresist on TiN/Al Multilayer by Ozone Treatment
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概要
- 論文の詳細を見る
The effect of ozone treatment on photoresist adhesion is studied in terms of thermodynamics. The peeling strength of a photoresist-substrate joint is increased by a factor of about two by ozone treatment. An increase in the surface free energy of the substrate is responsible for this adhesion improvement.
- 社団法人応用物理学会の論文
- 1996-09-15
著者
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Yasuoka Akihiko
Ulsi Laboratory Mitsubishi Electric Corporation
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Kawai Akira
Department Of Orthopaedic Surgery National Cancer Center Hospital
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Wakamiya W
Ulsi Development Center Mitsubishi Electric Corporation
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Wakamiya Wataru
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama M
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama Makoto
Lsi R&d Lab. Mitsubishi Electric Corp.
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Hirayama Makoto
Ulsi Laboratory Mitsubishi Electric Corporation
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Kawai Akira
Department Of Electrical Engineering Nagaoka University Of Technology
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Wakamiya Wataru
ULSI Development Center, Mitsubishi Electric Corporation
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