Effect of Low-Surface-Tension Liquid on Pattern Collapse Analyzed by Observing Dynamical Meniscus
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概要
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It has been recognized that the decrease in surface tension of rinse water prevents resist pattern collapse during the pattern development process. We have already reported that the resist pattern collapse occurs as induced by stress concentration at the resist pattern bottom due to an air tunnel, that is formed between parallel patterns. To clarify the effect of low-surface-tension liquid visibly, a transparent organic film is used as a monitoring pattern in this study, that is, direct observation through the transparent film (DOT) method. Two types of liquid; namely, (i) low-surface-tension liquid (ethyl alcohol $\gamma_{\text{L}}=22.5$ mJ/m2) and (ii) high-surface-tension liquid [deionized (DI) water $\gamma_{\text{L}}=72.9$ mJ/m2], are used. As a consequence, the air tunnel is not formed using the low surface tension liquid but is formed using DI water. The balance between Laplace and elastic forces of the pattern is estimated to determine pattern collapse and deformation. As a consequence, it is effective to employ low-surface-tension liquid as rinse liquid to prevent air tunnel formation.
- 2006-06-30
著者
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Suzuki Kenta
Department Of Animal Sciences Teikyo University Of Science And Technology
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Kawai Akira
Department Of Electrical Engineering Nagaoka University Of Technology
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Suzuki Kenta
Department of Electrical Engineering, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan
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