Effective Linewidth Measurement of 45-nm-Half-Pitch Ultraviolet Nanoimprint Lithography Patterns by Scanning Electron Microscope Inspection and Extremely Shallow Si Etching (Special Issue : Microprocesses and Nanotechnology)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Nishioka Yasushiro
Department Of Physics Faculty Of Science University Of Tokyo
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Suzuki Kenta
Department Of Animal Sciences Teikyo University Of Science And Technology
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Youn Sung-Won
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
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Wang Qing
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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