Evaluation of UV-Nanoimprinted Surface Roughness Using Si Mold with Atomically Flat Terraces
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概要
- 論文の詳細を見る
To evaluate the replication fidelity of UV-nanoimprint with a high degree of accuracy, we measured the surface roughness of a polymer that was UV-nanoimprinted using a Si mold with atomically flat terraces. Extremely shallow stripes with the same width as the step band on the Si mold were formed on the UV-nanoimprinted polymer. The peak-to-valley height of the terrace surface on the Si mold was 0.23 nm, while that of the UV-nanoimprinted polymer at the place corresponding to a flat terrace surface on the Si mold was 0.71 nm. The surface roughness of one region of the flat terrace surface on the Si mold was 0.05 nm root mean square (rms), while that of the UV-nanoimprinted polymer at the place corresponding to a flat terrace surface on the Si mold was 0.12 nm rms. The UV-nanoimprinted polymer becomes slightly rough at the atomic level.
- Japan Society of Applied Physicsの論文
- 2007-11-25
著者
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HIROSHIMA Hiroshi
National Institute of Advanced Industrial Science and Technology
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Itatani Taro
National Institute Of Advanced Industrial Science And Technology
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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Kurashima Yuichi
Department Of Applied Electronics Tokyo University Of Science
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Kurashima Yuichi
Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Miyamoto Iwao
Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Itatani Taro
National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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