Electron Mobility Degradation and Interface Dipole Formation in Direct-Contact HfO_2/Si Metal-Oxide-Semiconductor Field-Effect Transistors
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概要
- 論文の詳細を見る
- 2011-10-25
著者
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Itatani Taro
National Institute Of Advanced Industrial Science And Technology (aist)
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Itatani Taro
National Institute Of Advanced Industrial Science And Technology
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ISHII Hiroyuki
National Institute of Advanced Industrial Science and Technology (AIST)
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Yasuda Tetsuji
National Institute Of Advanced Industrial Science And Technology
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Miyata Noriyuki
National Institute Of Advanced Industrial Science And Technology
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Yasuda Tetsuji
National Institute for Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan
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