Ultrafast Active Transmission Lines with Low-$k$ Polyimide Integrated with Ultrafast Photoconductive Switches
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概要
- 論文の詳細を見る
We fabricated the first ultrafast active transmission lines with low dielectric constant (low-$k$) polyimide integrated with ultrafast photoconductive switches formed by the nano-anodization process. Electrical pulses as short as 290 fs were measured on this transmission line by an electrooptic sampling system based on a femtosecond laser. P-n junctions were inserted in the transmission line to control dispersion in lines, and low-$k$ polyimide was introduced to reduce dielectric and radiation losses.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-02-15
著者
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YAGI Shuichi
National Institute of Advanced Industrial Science and Technology
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Tacano Munecazu
Advanced Materials R&d Center Meisei University
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Fukushima Takafumi
Department Of Advanced Materials Chemistry Graduate School Of Engineering Yokohama National Universi
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KAWANAMI Hitoshi
National Institute of Advanced Industrial Science and Technology
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Itatani Taro
National Institute Of Advanced Industrial Science And Technology
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GORWADKAR Sucheta
National Institute of Advanced Industrial Science and Technology
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Tomoi Masao
Department Of Advanced Materials Chemistry Faculty Of Engineering Yokohama National University
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Itatani Hiroshi
Pi R&d Co.
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Uemura Takayuki
Department Of Advanced Materials Chemistry Graduate School Of Engineering Yokohama National Universi
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Tacano Munecazu
Advanced Materials R&D Center, Meisei University, 2-1-1 Hodokubo, Hino, Tokyo 191-8506, Japan
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Itatani Hiroshi
PI R&D Co., 12-5 Torihama, Kanazawa-ku, Yokohama, Kanagawa 236-0002, Japan
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Kawanami Hitoshi
National Institute of Advanced Industrial Science and Technology, Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Yagi Shuichi
National Institute of Advanced Industrial Science and Technology, Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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