Photosensitive Polyesterimides Based on Reaction Development Patterning
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概要
- 論文の詳細を見る
- Society of Polymer Science, Japanの論文
- 2007-02-15
著者
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OYAMA Toshiyuki
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
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Tomoi Masao
Department Of Advanced Materials Chemistry Faculty Of Engineering Yokohama National University
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SUGAWARA Shintaro
Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
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Oyama Toshiyuki
Department Of Advanced Materials Chemistry Faculty Of Engineering Yokohama National University
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Sugawara Shintaro
Department Of Advanced Materials Chemistry Faculty Of Engineering Yokohama National University
関連論文
- Novel Aprotic Polar Polymers V. Synthesis of Poly(HMPA) by Ring-Opening Polymerization
- Novel Aprotic Polar Polymers IV. Synthesis of Poly[(N-bis(dimethylamino)phosphorylethylenimine] as a Polymer Homolog of Hexamethylphosphoramide
- Ultrafast Active Transmission Lines with Low-k Polyimide Integrated with Ultrafast Photoconductive Switches
- Synthesis of Novel Reactive Polymers Having Oxirane Structure in the Main Chain by Polycondensation of Bis(sulfonium ylide) with Dialdehyde
- Photosensitive Polyesterimides Based on Reaction Development Patterning
- Ultrafast Active Transmission Lines with Low-$k$ Polyimide Integrated with Ultrafast Photoconductive Switches
- Phase-transfer reactions catalyzed by phosphoric triamides containing hydrophobic groups.
- The Effects of Substituents and Solvents on the Structure of Fluorenyl and Cyclopentadienyl Salts
- The Metalation of Fluorene by Means of the Diethylmagnesium–Hexamethylphosphoramide System