Pattern Transfer of Sol-Gel Photocurable Polymer Using Nanoimprinting Method(M^4 processes and micro-manufacturing for science)
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概要
- 論文の詳細を見る
The transfer characteristics of sol-gel photocurable polymer were investigated using nanoimprinting method. This polymer is a kind of thermoplastic polymer which was hardened by exposure of ultraviolet (UV) light. Using this polymer, the release before UV hardened method and the release after UV hardened method were examined. In the case of the release before UV hardened method, micrometer patterns were transferred, but nanometer patterns couldn't replicate. On the other hand, nanometer patterns were successfully obtained using the release after UV hardened method.
- 一般社団法人日本機械学会の論文
- 2005-10-18
著者
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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Kubo Keiji
Kuraray Co. Ltd Tsukuba Research Laboratories
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HISAZUMI Tsuyoshi
Department of Applied Electronics, Tokyo University of Science
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MIYAMOTO Iwao
Department of Applied Electronics, Tokyo University of Science
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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Hisazumi Tsuyoshi
Department Of Applied Electronics Tokyo University Of Science
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