Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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MIYAMOTO Iwao
Department of Applied Electronics, Tokyo University of Science
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KURASHIMA Yuichi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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HIROSHIMA Hiroshi
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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KOMURO Masanori
MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie
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