Three-dimensional Nano-pattern Replication Using UV Nanoimprint Lithography(M^4 processes and micro-manufacturing for science)
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概要
- 論文の詳細を見る
We conducted fabrication process of three-dimensional (3D) mold using spin-on-glass (SOG) material as a positive electron beam (EB) resist and buffered hydrofluoric acid as the developer. The SOG resist depth control was demonstrated by the changing the EB acceleration voltage or the changing the EB dose. In either case, 3D patterning was possible. In particular, nanometer order pitch holes arrays were obtained to optimize EB dose at high voltage acceleration. Using delineated resist patterns as a 3D mold, UV nanoimprint lithography was carried out and nanometer size patterns were faithfully replicated.
- 一般社団法人日本機械学会の論文
- 2005-10-18
著者
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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ISHII Yoshiaki
Department of Orthopedic Surgery, Kyorin University School of Medicine
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Miyazawa Takayuki
Department Of Veterinary Microbiology Graduate School Of Agricultural And Life Sciences The Universi
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Miyazawa Takayuki
Department Of Applied Electronics Tokyo University Of Science
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Miyazawa Takayuki
Department Of Applied Chemistry Tokyo University Of Agriculture And Technology
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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Ishii Yoshiaki
Department Of Applied Electronics Tokyo University Of Science
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HISAZUMI Tsuyoshi
Department of Applied Electronics, Tokyo University of Science
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MIYAMOTO Iwao
Department of Applied Electronics, Tokyo University of Science
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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Hisazumi Tsuyoshi
Department Of Applied Electronics Tokyo University Of Science
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