A18 3D metal nano pattern transfer on PET using novel release method(M4 processes and micro-manufacturing for science)
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概要
- 論文の詳細を見る
A strong need exists for a fine three-dimensional metal patterning technique, which is used for the next generation devices, such as patterned media, plasmon photonic and nano-scale electrode. We have developed a technique for transferring three-dimensional metal patterns onto a poly(ethylene terephthalate) substrate by nanoimprint lithography using a metal oxide release layer. A three-dimensional nanoimprint mold was fabricated by control of acceleration voltage electron beam lithography (CAV-EBL). As a result, three-dimensional metal patterns were obtained with metal oxide release layer.
- 一般社団法人日本機械学会の論文
- 2009-12-01
著者
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UNNO Noriyuki
Department of Applied Electronics, Tokyo University of Science
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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Unno Noriyuki
Department Of Applied Electronics Tokyo University Of Science:research Fellow Of The Japan Society F
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ISHIKAWA Shoichiro
Department of Applied Electronics, Tokyo University of Science
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Ishikawa Shoichiro
Department Of Applied Electronics Tokyo University Of Science
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