A29 Ion-bombardment-enhanced etching of quartz(M4 processes and micro-manufacturing for science)
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概要
- 論文の詳細を見る
Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.
- 一般社団法人日本機械学会の論文
- 2009-12-01
著者
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Morita Noboru
Department Of Mechanical And Intellectual Systems Engineering University Of Toyama
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Morita Noboru
University Of Toyama
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Kogo Y
Department Of Materials Science And Technology Tokyo University Of Science
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Kogo Yasuo
Department Of Material Science And Engineering Science University Of Tokyo
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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Momota Sadao
Kochi University Of Technology
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Taniguchi J
Department Of Applied Electronics Tokyo University Of Science
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OKUMOTO Takashi
Department of Applied Electronics, Tokyo University of Science
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Okumoto Takashi
Department Of Applied Electronics Tokyo University Of Science
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KAWASEGI Noritaka
Toyama Industrial Technology Center
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