Three-Dimensional Nanofabrication Utilizing Selective Etching of Silicon Induced by Focused Ion Beam Irradiation
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概要
- 論文の詳細を見る
rights: 本文データは社団法人日本機械学会の許諾に基づきCiNiiから複製したものであるA simple process of fabricating a three-dimensional nanostructure on a silicon surface was investigated in this study. The silicon surface area irradiated by focused ion beam (FIB) was selectively etched in HF, whereas the non-irradiated area was scarcely etched, and consequently, a concave nanostructure was fabricated on the irradiated area. To control the depth of the nanostructure, the depth dependence on ion irradiation parameters was investigated. As a result, it was found that the depth of the irradiated area can be controlled by changing ion irradiation parameters, such as dose and ion energy. Under a low-dose condition, the irradiated area was scarcely etched, due to the formation of an amorphous layer on the interior of silicon. Subsequently, it was etched in KOH to evaluate the mechanism of this phenomenon. In addition, the surface roughness dependence on ion irradiation parameters was investigated. Finally, three-dimensional nanostructures were fabricated on the basis of these results, suggesting that this method is a novel three-dimensional nanofabrication method.
- 一般社団法人日本機械学会の論文
- 2006-06-15
著者
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YAMADA Shigeru
Department of Social Systems Engineering, Faculty of Engineering, Tottori University
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MORITA Noboru
Department of Chemistry, Graduate School of Science, Tohoku University
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TANIGUCHI Jun
Department of Applied Electronics, Tokyo University of Science
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Morita Noboru
Department Of Mechanical And Intellectual Systems Engineering University Of Toyama
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宮本 岩男
東京理科大学基礎工学部
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Morita Noboru
Department Of Chemistry Graduate School Of Science Tohoku University
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Yamada Shigeru
Department Of Mechanical And Intellectual Systems Engineering University Of Toyama
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Ashida Kiwamu
Advanced Manufacturing Research Institute National Institute Of Advanced Industrial Science And Tech
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Taniguchi Jun
Department Of Applied Electronics Tokyo University Of Science
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MIYAMOTO Iwao
Department of Applied Electronics, Tokyo University of Science
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Miyamoto Iwao
Department Of Applied Electronics Tokyo University Of Science
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KAWASEGI Noritaka
Graduate School of Science and Engineering, University of Toyama
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TAKANO Noboru
Department of Mechanical and Intellectual Systems Engineering, University of Toyama
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OYAMA Tatsuo
Department of Mechanical and Intellectual Systems Engineering, University of Toyama
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Oyama Tatsuo
Department Of Mechanical And Intellectual Systems Engineering University Of Toyama
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Takano Noboru
Department Of Mechanical And Intellectual Systems Engineering University Of Toyama
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Taniguchi J
Department Of Applied Electronics Tokyo University Of Science
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KAWASEGI Noritaka
Toyama Industrial Technology Center
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Yamada Shigeru
Department Of Food & Health Sciences Faculty Of Human Life Sciences Jissen Women's Universi
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宮本 岩男
東京理科大学基礎工学研究科電子応用工学専攻
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Yamada Shigeru
Department of Biological Science and Technology, Science University of Tokyo
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